Sputter and E-gun coater

Sputtering

E-gun coater

Manufacturer: BRANCHY

Service:

We provide sample coating services by using E-beam or Sputtering evaporations.

High reflective coatings (HR) and Anti-Reflective coating (AR).

Manufacturer: BRANCHY

Service:

We provide sample coating services by using E-beam or Sputtering evaporations.

High reflective coatings (HR) and Anti-Reflective coating (AR).

Specification:

For Sputtering coating:

Magnetron type – flat round;
Mode – RF;
Frequency – 13,66 GHz;
Max. power – 1,2 kW;
Cooling – indirect;
Target size – 4";
Substrate size – 4";
Number of substrates – 1;
Available targets – Al, Ni, SiO2. Other targets can be ordered additionally.

During the deposition process in the vacuum chamber can be added gases: Ar, O2, N2.

Material Restrictions:

Most substrates are allowed. Consult a staff member prior to new processes on substrates other than glass, quartz, or silicon. Only pure metals are recommended. The evaporation process typically does not allow for effective deposition of compound materials. Photoresist is typically allowed but ask a staff member prior to performing a new process.

Specification:

Description: Coater consist of two vacuum chambers with common pumping system. One chamber for e-beam deposition, other chamber for sputtering. Only one method can be used in the same time.

For E-gun coating:

Max. operating voltage – 10 kV;
Max. emission current – 500 mA;
Max. e-beam evaporator power – 5 kW;
Crucible volume – 8 ccm;
Number of crucibles – 4;
Thickness control – quartz sensor;
Substrate heating – halogen lamps;
Heating temperature – up to 250 C
Substrate size* – 3";
Number of substrates* – 4;

Available martials for deposition are Si, SiO2, Fe2O3, C2H5CO2Li, Ta2O5, TiO2, Nd2O3, Sb, Zn, MgO, Ni/Cr.

Charge: OEM

The prices do not include material charge.

Academic Institution

NTD 25/min

Non-academic Institution

NTD 50/min

Contact:

Mr. Alexey Kopeykin

Email: a.kopeykin@gapp.nthu.edu.tw

Phone: +886-3-5162333