Manufacturer: Deya Optronic Co. (德揚光電)

Service:

• We provide services to transfer a geometric pattern from a photomask to a photoresist on the substrate. The minimum line width can reach 1um.

• The 5” square photomasks with the period is from 1um to 31um are available in our lab.

Specification:

Contact photolithography exposure tool for 4” wafers. An optimized process can achieve 1 um line/space patterns with a layer-to-layer registration accuracy about 1 um. To operate the lens and the UV lamp, pressure has to set around 5kgf/cm2.

Material Restrictions: Uses 5” square photomasks. Configured for exposure of 4” wafers; smaller chips can be accommodated using a carrier wafer.

Contact:

• Mr. Alexey Kopeykin

​Email: a.kopeykin@gapp.nthu.edu.tw

Phone: +886-3-5162333